
SS-3300S | SCREEN Semiconductor Solutions Co., Ltd.
4. Emissions reduction solution (optional) An optional exhaust recirculation system reduces total emissions by 65%, ensuring clean equipment operation to support ESG measures. 1. Based on …
Company Profile | SCREEN Semiconductor Solutions Co., Ltd.
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SB-3300 - SCREEN Semiconductor Solutions Co., Ltd.
4. High productivity With a space-saving 4-level stacked-tower construction and 16 processing chambers, the SB-3300 delivers an industry-leading practical back-side cleaning capacity of up to …
SCREEN and IBM Sign Agreement for Next-Generation EUV …
Sep 24, 2025 · Through this joint development agreement, IBM and SCREEN will work to further accelerate the development of cleaning technologies for advanced semiconductor manufacturing …
Products | SCREEN Semiconductor Solutions Co., Ltd.
Single Wafer Cleaner SU-3400 The Evolution of the World's No. 1* Cleaning Equipment * Based on SCREEN in-house research
Innovation for sustainable semiconductor manufacturing—the SCREEN …
To address this issue, as a leader in semiconductor production equipment, the SCREEN Group has developed an innovative technology for reducing organic wastewater with the potential to …
IR library | SCREEN Holdings Co., Ltd.
This page provides materials for SCREEN Holdings’ shareholders and investors. It contains a range of information, including details of shareholders meetings, management policies, share prices and …
FC-821L - SCREEN Semiconductor Solutions Co., Ltd.
1. These systems enable half-pitch transfer of wafers. The size of baths has been reduced to minimize the volume of chemicals and DI water used. 2. The CHB chemical circulation bath allows processing …
SU-2000 - SCREEN Semiconductor Solutions Co., Ltd.
As its fourth successful Frontier project development, Screen is proud to present the SU-2000, a Single Wafer Cleaner ideally suited to green device production.
SU-3400 - SCREEN Semiconductor Solutions Co., Ltd.
SCREEN Semiconductor Solutions have been developing single-wafer cleaning equipment since 1983. Since then, we have long evolved the technology by pursuing optimal treatment of the air-liquid …